CHARACTERISTICS OF A LOWERED-PRESSURE, HIGH-FREQUENCY INDUCTIVE JET CHARGE IN PROCESSES OF MODIFICATION OF PRODUCTS

The parameters of a lowered-pressure high-frequency inductive discharge, which should be taken into account in the modifi cation of products diff erent in physical nature, were investigated. The distributions of temperature, of the velocity of plasma movement, of the strength of the magnetic fi eld, and of the density of the ion current in the jet of such a discharge are presented. It is shown that a higher temperature and a smaller temperature gradient in the jet of this discharge are attained at a pressure of 66.5 Pa in it. A separate investigation of the distribution of the temperature in the discharge jet in the presence of a material treated with it has been performed. The contribution of the implantation of ions into a material to the heating of the material in the process of its treatment in the jet of a high-frequency inductive discharge of lowered pressure was estimated.
The parameters of a lowered-pressure high-frequency inductive discharge, which should be taken into account in the modifi cation of products diff erent in physical nature, were investigated. The distributions of temperature, of the velocity of plasma movement, of the strength of the magnetic fi eld, and of the density of the ion current in the jet of such a discharge are presented. It is shown that a higher temperature and a smaller temperature gradient in the jet of this discharge are attained at a pressure of 66.5 Pa in it. A separate investigation of the distribution of the temperature in the discharge jet in the presence of a material treated with it has been performed. The contribution of the implantation of ions into a material to the heating of the material in the process of its treatment in the jet of a high-frequency inductive discharge of lowered pressure was estimated.
Author:  I. Sh. Abdullin, I. K. Nekrasov, F. R. Sagitova, and S. V. Mironov
Keywords:  plasma modifi cation, high-frequency inductive discharge, fl ow of low-energy ions, modifi cation of materials
Page:  569